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Contact Resistance of Thin Metal Film Contacts
Mid Sweden University, Faculty of Science, Technology and Media, Department of Information Technology and Media.
Mid Sweden University, Faculty of Science, Technology and Media, Department of Information Technology and Media.
Mid Sweden University, Faculty of Science, Technology and Media, Department of Information Technology and Media.
2006 (English)In: IEEE transactions on components and packaging technologies (Print), ISSN 1521-3331, E-ISSN 1557-9972, Vol. 29, no 2, 371-378 p.Article in journal (Refereed) Published
Abstract [en]

To be able to reduce the size of products having electronic devices, it becomes more and more important to miniaturize the electro-mechanical parts of the system. The use of micro mechanical connectors and contact structures implies the need of methods for estimating the properties of such devices. This work will, by use of finite element modeling, treat the influence of a thin film constituting at least one of the contacting members of an electrical contact. The error introduced by using the traditional Maxwell/Holm contact constriction resistance theory will be investigated. Numerical methods are used to present a way to approximate the total resistance for the thin metal film contact.

Place, publisher, year, edition, pages
2006. Vol. 29, no 2, 371-378 p.
Keyword [en]
Contact Resistance, Constriction Resistance
National Category
Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:miun:diva-2954DOI: 10.1109/TCAPT.2006.875891ISI: 000237982600020Scopus ID: 2-s2.0-33744831222Local ID: 2683OAI: oai:DiVA.org:miun-2954DiVA: diva2:27986
Note

VR-Materials Science

Available from: 2008-09-30 Created: 2008-09-30 Last updated: 2016-09-28Bibliographically approved

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Norberg, GunnarDejanovic, SlavkoHesselbom, Hjalmar
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