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Patterning of Reactively Sputteres Tantalum Pentoxide, a High Epsilon Material, by Plasma Etching
Jonsson, Lars
Uppsala universitet, Institutionen för materialvetenskap.
Engelmark, Fredrik
Uppsala universitet, Institutionen för materialvetenskap.
Du, Jing
Uppsala universitet, Institutionen för materialvetenskap.
Hedlund, Christer
Uppsala universitet, Institutionen för materialvetenskap.
ORCID iD:
0000-0003-2352-9006
Smith, Ulf
Uppsala universitet, Institutionen för materialvetenskap.
Blom, Hans-Olof
Uppsala universitet, Institutionen för materialvetenskap.
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1998 (English)
In:
The American Vacuum Society 45th National Symposium in Baltimore, 1998
Conference paper (Refereed)
Place, publisher, year, edition, pages
1998.
National Category
Other Electrical Engineering, Electronic Engineering, Information Engineering
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URN:
urn:nbn:se:miun:diva-31588
OAI: oai:DiVA.org:miun-31588
DiVA, id:
diva2:1140963
Conference
The American Vacuum Society 45th National Symposium in Baltimore
Available from:
2007-03-01
Created:
2017-09-13
Last updated:
2017-09-13
Bibliographically approved
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Hedlund, Christer
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modern-language-association-8th-edition
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modern-language-association-8th-edition
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