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Trimethylboron as Single-Source Precursor for Boron-Carbon Thin Film Synthesis by Plasma Chemical Vapor Deposition
Linköping Univ, Dept Phys Chem & Biol., Linköping; European Spallat Source ERIC, Lund.
Linköping Univ, Dept Phys Chem & Biol., Linköping; European Spallat Source ERIC, Lund.
Linköping Univ, Dept Phys Chem & Biol, Linköping.
Linköping Univ, Dept Phys Chem & Biol., Linköping; European Spallat Source ERIC, Lund.
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2016 (English)In: The Journal of Physical Chemistry C, ISSN 1932-7447, E-ISSN 1932-7455, Vol. 120, no 38, p. 21990-21997Article in journal (Refereed) Published
Abstract [en]

Boron carbon (BxC) thin films are potential neutron converting layers for B-10-based neutron detectors. However, as common material choices for such detectors do not tolerate temperatures above 500 degrees C, a low temperature deposition route is required. Here, we study trimethylboron B(CH3)(3) (TMB) as a single-source precursor for the deposition of BxC thin films by plasma CVD using Ar plasma. The effect of plasma power, TMB/Ar flow ratio and total pressure, on the film composition, morphology, chemical bonding, and microstructures are investigated. Dense and boron-rich films (B/C = 1.9) are achieved at high TMB flow under a low total pressure and high plasma power, which rendered an approximate substrate temperature of similar to 300 degrees C. Films mainly contain B-C bonds with the presence of B-O and C-C, which is attributed to be the origin of formed amorphous carbon in the films. The high H content 15 +/- 5 at. %) is almost independent of deposition parameters and contributed to lower the film density (2.16 g/cm(3)). The plasma compositional analysis shows that the TMB molecule decomposes to mainly atomic H, C-2, BH, and CH. A plasma chemical model for the decomposition of TMB with BH and CH as the plausible film depositing species in the plasma is proposed.

Place, publisher, year, edition, pages
2016. Vol. 120, no 38, p. 21990-21997
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Natural Sciences
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URN: urn:nbn:se:miun:diva-29286DOI: 10.1021/acs.jpcc.6b06529ISI: 000384626800097Scopus ID: 2-s2.0-84989862617Local ID: STCOAI: oai:DiVA.org:miun-29286DiVA, id: diva2:1046393
Available from: 2016-11-14 Created: 2016-11-14 Last updated: 2017-08-09Bibliographically approved

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Hall-Wilton, Richard J.

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