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Characterization and optimization of a dry etching process for silicon nitride spacer formation
Uppsala universitet, Institutionen för materialvetenskap.
Uppsala universitet, Institutionen för materialvetenskap.ORCID iD: 0000-0003-2352-9006
Uppsala universitet, Institutionen för materialvetenskap.
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1997 (English)In: The 44th international symposium of the American Vacuum Society, San José, USA, 1997Conference paper (Refereed)
Place, publisher, year, edition, pages
1997.
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Other Electrical Engineering, Electronic Engineering, Information Engineering
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URN: urn:nbn:se:miun:diva-31591OAI: oai:DiVA.org:miun-31591DiVA, id: diva2:1140955
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The 44th international symposium of the American Vacuum Society, San José, USA
Available from: 2007-03-05 Created: 2017-09-13 Last updated: 2017-09-13Bibliographically approved

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Hedlund, Christer

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