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Analysis and Simulation of Mask Erosion During Etching
Uppsala universitet, Institutionen för materialvetenskap.
Uppsala universitet, Institutionen för materialvetenskap.
Uppsala universitet, Institutionen för materialvetenskap.
Uppsala universitet, Institutionen för materialvetenskap.ORCID iD: 0000-0003-2352-9006
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1999 (English)In: American Vacuum Society 46th National Symposium, Seattle, USA, 1999Conference paper (Refereed)
Place, publisher, year, edition, pages
1999.
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Other Electrical Engineering, Electronic Engineering, Information Engineering
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URN: urn:nbn:se:miun:diva-31611OAI: oai:DiVA.org:miun-31611DiVA, id: diva2:1140921
Conference
American Vacuum Society 46th National Symposium, Seattle, USA
Available from: 2007-03-01 Created: 2017-09-13 Last updated: 2017-09-13Bibliographically approved

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Hedlund, Christer

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CiteExportLink to record
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