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Submicron YBa2Cu3Ox ramp Josephsson junctions
Mittuniversitetet, Fakulteten för naturvetenskap, teknik och medier, Institutionen för teknik, fysik och matematik.
2002 (engelsk)Inngår i: Applied Physics Letters, ISSN 0003-6951, Vol. 80, nr 6, s. 1022-1024Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

Submicron YBa2Cu3Ox /PrBa2Cu2.6Ga0.4Ox /YBa2Cu3Ox ramp-type Josephson junctions were fabricated and tested. The submicron bridges in the top electrode were patterned by e-beam lithography and Ar ion milling through an amorphous carbon (a-C) mask. Junctions with width ranging from 0.2 to 8 mm and oriented along different crystal directions of YBa2Cu3Ox have been produced. Current–voltage characteristics show a behavior consistent with the resistively shunted junction model with small excess current. Junction critical current densities of about 10 kA/cm2 and characteristic voltages up to 6 mV were measured at 4.2 K for the submicron junctions. Junctions along different crystal orientations showed different characteristics suggesting an influence from the d-wave order parameter.

sted, utgiver, år, opplag, sider
2002. Vol. 80, nr 6, s. 1022-1024
Emneord [en]
Supraledare, Nanoteknik, elektronstrålelitografi
HSV kategori
Identifikatorer
URN: urn:nbn:se:miun:diva-3793DOI: 10.1063/1.1448176Lokal ID: 4508OAI: oai:DiVA.org:miun-3793DiVA, id: diva2:28825
Tilgjengelig fra: 2008-09-30 Laget: 2008-09-30 Sist oppdatert: 2011-01-10bibliografisk kontrollert

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